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Highly selective SiO2/Si reactive ion beam etching withlow energy fluorocarbon ions

✍ Scribed by E. Collard; C. Lejeune; J.P. Grandchamp; J.P. Gilles; P. Scheiblin


Book ID
114085789
Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
512 KB
Volume
193-194
Category
Article
ISSN
0040-6090

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