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Ion bombardment energy and SiO[sub 2]/Si fluorocarbon plasma etch selectivity

✍ Scribed by S. Wang; A. E. Wendt

Book ID: 125515611
Publisher: AVS (American Vacuum Society)
Year: 2001
Tongue: English
Weight: 343 KB
Volume: 19
Category: Article
ISSN: 0734-2101
DOI: 10.1116/1.1387056

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