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Langmuir probe measurements in an inductively coupled plasma: Electron energy distribution functions in polymerizing fluorocarbon gases used for selective etching of SiO[sub 2]

✍ Scribed by Gaboriau, Freddy; Peignon, Marie-Claude; Cartry, Gilles; Rolland, Laetitia; Eon, David; Cardinaud, Christophe; Turban, Guy


Book ID
125516714
Publisher
AVS (American Vacuum Society)
Year
2002
Tongue
English
Weight
380 KB
Volume
20
Category
Article
ISSN
0734-2101

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