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Deep single step vertical ICP–RIE etching of ion beam sputter deposited SiO2/Si multilayer stacks

✍ Scribed by Messow, Ferdinand; Welch, Colin; Eifert, Alexander; Ang, Wei Chung; Hoe, Nee Shiuan; Kusserow, Thomas; Hillmer, Hartmut


Book ID
122134142
Publisher
Elsevier Science
Year
2014
Tongue
English
Weight
565 KB
Volume
113
Category
Article
ISSN
0167-9317

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