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High surface passivation quality and thermal stability of ALD Al2O3 on wet chemical grown ultra-thin SiO2 on silicon

✍ Scribed by Stefan Bordihn; Peter Engelhart; Verena Mertens; Gerd Kesser; Dennis Köhn; Gijs Dingemans; Magda M. Mandoc; Jörg W. Müller; W.M.M. Kessels

Book ID: 118435673
Publisher: Elsevier
Year: 2011
Weight: 357 KB
Volume: 8
Category: Article
ISSN: 1876-6102
DOI: 10.1016/j.egypro.2011.06.197

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