Dense, dendritic and porous SiO 2 films were prepared by laser chemical vapor deposition (LCVD) using a high-power continuous-wave mode Nd: YAG laser (206 W) and a TEOS (tetraethyl orthosilicate) precursor. The effects of laser power (P L ) and total chamber pressure (P tot ) on the microstructure a
✦ LIBER ✦
High-speed deposition of Y–Si–O films by laser chemical vapor deposition using Nd:YAG laser
✍ Scribed by Akihiko Ito; Jun Endo; Teiichi Kimura; Takashi Goto
- Publisher
- Elsevier Science
- Year
- 2010
- Tongue
- English
- Weight
- 521 KB
- Volume
- 204
- Category
- Article
- ISSN
- 0257-8972
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