Preparation of Ca–Si–O films by chemical vapor deposition

✍ Scribed by Shekhar Nath; Rong Tu; Takashi Goto

• Publisher: Elsevier Science
• Year: 2010
• Tongue: English
• Weight: 747 KB
• Volume: 205
• Category: Article
• ISSN: 0257-8972
• DOI: 10.1016/j.surfcoat.2010.10.024

✦ Synopsis

Ca-Si-O films were prepared by chemical vapor deposition using calcium dipivaloylmethanates (Ca(dpm) 2 ) and tetraethyl orthosilicate (TEOS). The effects of the Si to Ca precursor molar ratio (R Si/Ca ) and the substrate temperature (T sub ) on the crystal phase, microstructure and deposition rate of Ca-Si-O films were investigated. Three main phases, i.e., CaSiO 3 , Ca 2 SiO 4 and Ca 3 SiO 5 , were obtained along with the CaO and amorphous phases. At T sub = 923 to 1023 K and R Si/Ca = 49, Ca 2 SiO 4 film in a single phase was obtained. The microstructure was granular and changed from a cauliflower-like to a granular type with increasing R Si/Ca . The maximum deposition rate was 240 μm h -1 at T sub = 1323 K and R Si/Ca = 29.