High-speed deposition of dense, dendritic and porous SiO2 films by Nd: YAG laser chemical vapor deposition

✍ Scribed by Jun Endo; Akihiko Ito; Teiichi Kimura; Takashi Goto

• Publisher: Elsevier Science
• Year: 2010
• Tongue: English
• Weight: 985 KB
• Volume: 166
• Category: Article
• ISSN: 0921-5107
• DOI: 10.1016/j.mseb.2009.12.047

✦ Synopsis

Dense, dendritic and porous SiO 2 films were prepared by laser chemical vapor deposition (LCVD) using a high-power continuous-wave mode Nd: YAG laser (206 W) and a TEOS (tetraethyl orthosilicate) precursor. The effects of laser power (P L ) and total chamber pressure (P tot ) on the microstructure and deposition rate (R dep ) were investigated. Amorphous SiO 2 films were obtained independent of P L and P tot . Flame formation was observed between the nozzle and the substrate at P L > 160 W and P tot > 15 kPa. At P L = 206 W, dense, dendritic and porous SiO 2 films were obtained at P tot < 20 kPa, P tot = 23 kPa and P tot > 25 kPa, respectively. The R dep increased thousands of times under flame formation conditions, the highest R dep being reached at 1200 m h -1 , 22,000 m h -1 and 28,000 m h -1 for the dense, dendritic and porous SiO 2 films, respectively.