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High-quality epitaxial Si growth at low temperatures by atmospheric pressure plasma CVD

✍ Scribed by K. Yasutake; H. Ohmi; Y. Kirihata; H. Kakiuchi

Book ID
108290163
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
247 KB
Volume
517
Category
Article
ISSN
0040-6090

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