✦ LIBER ✦

High-pressure oxidation for thin gate insulator process

✍ Scribed by Hirayama, M.; Miyoshi, H.; Tsubouchi, N.; Abe, H.

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

High-Pressure Oxidation for Thin Gate In

✍ Hirayama, M.; Miyoshi, H.; Tsubouchi, N.; Abe, H. 📂 Article 📅 1982 🏛 IEEE 🌐 English ⚖ 769 KB

Solution processed hafnium oxide as a ga

✍ Avis, Christophe; Kim, Youn Goo; Jang, Jin 📂 Article 📅 2012 🏛 Royal Society of Chemistry 🌐 English ⚖ 726 KB

Rutile-type TiO2 thin film for high-k ga

✍ Masaru Kadoshima; Masahiko Hiratani; Yasuhiro Shimamoto; Kazuyoshi Torii; Hirosh 📂 Article 📅 2003 🏛 Elsevier Science 🌐 English ⚖ 402 KB

Top-gate LZTO thin-film transistors with

✍ Yue, Lan; Pu, Haifeng; Pang, Shujian; Li, Honglei; Zhang, Qun 📂 Article 📅 2012 🏛 EDP Sciences 🌐 English ⚖ 793 KB

Novel interface nitridation process for

✍ Rahat, I.; Shappir, J.; Ben-Atar, D. 📂 Article 📅 1993 🏛 IEEE 🌐 English ⚖ 564 KB

High-quality oxide/nitride/oxide gate in

✍ Gaffey, B.; Guido, L.J.; Wang, X.W.; Ma, T.P. 📂 Article 📅 2001 🏛 IEEE 🌐 English ⚖ 132 KB