๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

High depth resolution depth profiling of metal films using SIMS and sample rotation

โœ Scribed by D.E. Sykes; A. Chew; J. Hems; K. Stribley


Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
543 KB
Volume
100-101
Category
Article
ISSN
0169-4332

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


SIMS depth profiling of TiOxNy films
โœ Metson, J. B.; Prince, K. E. ๐Ÿ“‚ Article ๐Ÿ“… 1999 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 112 KB ๐Ÿ‘ 1 views

Amorphous TiO x N y films of varying stoichiometry have been deposited on Si and Cu substrates using ionassisted deposition (IAD). The structure of the films and the effects of annealing in the 200-450 ยฐC range have been examined. Secondary ion mass spectrometry (SIMS) has been used to investigate