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High conductivity, shallow doping in silicon by ion implantation and furnace annealing

โœ Scribed by S. Wu; M.W. Hodel; F. Samadpour


Book ID
113277350
Publisher
Elsevier Science
Year
1985
Tongue
English
Weight
609 KB
Volume
6
Category
Article
ISSN
0168-583X

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