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High dose nitrogen and carbon shallow implantation in Si by plasma immersion ion implantation

✍ Scribed by M Ueda; H Reuther; R Gunzel; A.F Beloto; E Abramof; L.A Berni

Book ID
114164488
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
109 KB
Volume
175-177
Category
Article
ISSN
0168-583X

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