๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Etching and structural changes in nitrogen plasma immersion ion implanted polystyrene films

โœ Scribed by B.K. Gan; M.M.M. Bilek; A. Kondyurin; K. Mizuno; D.R. McKenzie

Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
195 KB
Volume
247
Category
Article
ISSN
0168-583X

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

Etching and structural changes of polyst
Etching and structural changes of polystyrene films during plasma immersion ion implantation from argon plasma
โœ A. Kondyurin; B.K. Gan; M.M.M. Bilek; K. Mizuno; D.R. McKenzie ๐Ÿ“‚ Article ๐Ÿ“… 2006 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 431 KB

Polystyrene films of 100 nm thickness were modified using plasma immersion ion implantation (PIII) with argon ions of energy 20 keV and fluences in the range 2 โ€ข 10 14 -2 โ€ข 10 16 ions cm ร€2 . The structure and properties of the films were determined by ellipsometry and FTIR spectroscopy, as well as