𝔖 Bobbio Scriptorium

✦ LIBER ✦

Interaction effects between arsenic and boron ions implanted in silicon during furnace annealing and RTA

✍ Scribed by Li Guohui; Ma Yi; Zhang Tonghe; Luo Yan

Publisher: Elsevier Science
Year: 1989
Tongue: English
Weight: 366 KB
Volume: 39
Category: Article
ISSN: 0042-207X
DOI: 10.1016/0042-207x(89)90197-8

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Interaction effects between arsenic and

Interaction effects between arsenic and boron ions implanted in silicon during furnace annealing and RTA : Li Guohui, Ma Yi, Zhang Tonghe and Luo Yan. Vacuum 39(2–4), 205 (1989)

📂 Article 📅 1990 🏛 Elsevier Science 🌐 English ⚖ 140 KB

Cooperative effects between arsenic and

Cooperative effects between arsenic and boron in silicon during simultaneous diffusions from ion implanted and chemical source predepositions

✍ Richard B. Fair 📂 Article 📅 1974 🏛 Elsevier Science 🌐 English ⚖ 716 KB

Cooperative effects between arsenic and

Cooperative effects between arsenic and boron in silicon during simultaneous diffusions from ion implanted and chemical source predepositions : R. B. Fair. Solid St. Electron.17, 17 (1974)

📂 Article 📅 1974 🏛 Elsevier Science 🌐 English ⚖ 177 KB