Interaction effects between arsenic and boron ions implanted in silicon during furnace annealing and RTA : Li Guohui, Ma Yi, Zhang Tonghe and Luo Yan. Vacuum 39(2–4), 205 (1989)

• Publisher: Elsevier Science
• Year: 1990
• Tongue: English
• Weight: 140 KB
• Volume: 30
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(90)90151-c