Growth, structural, and magnetic properties of iron nitride thin films deposited by dc magnetron sputtering
β Scribed by X. Wang; W.T. Zheng; H.W. Tian; S.S. Yu; W. Xu; S.H. Meng; X.D. He; J.C. Han; C.Q. Sun; B.K. Tay
- Book ID
- 108418170
- Publisher
- Elsevier Science
- Year
- 2003
- Tongue
- English
- Weight
- 261 KB
- Volume
- 220
- Category
- Article
- ISSN
- 0169-4332
No coin nor oath required. For personal study only.
π SIMILAR VOLUMES
The NiO x thin films were deposited by reactive dc-magnetron sputtering from a nickel metal target in Ar + O 2 with the relative O 2 content 5%. The as-deposited NiO x thin films could represent a two-component system comprising crystalline NiO particles dispersed in an amorphous Ni 2 O 3 . Decompos
Carbon nitride (CN x /CN x ) multilayers with sequential sp 3 -rich and sp 2 -rich layers were deposited on c-Si substrate by direct current magnetron sputtering. The composition, microstructure and morphology of the films were investigated by the X-ray photoelectron spectroscopy and transmission el