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Magnetic and structural properties of dc magnetron sputtered CoCr thin films

✍ Scribed by H-J Anklam; L Fritzsch; R Mattheis; S Müller-Pfeiffer; F Thrum


Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
303 KB
Volume
40
Category
Article
ISSN
0042-207X

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Characterization of reactive DC magnetro
✍ B. Subramanian; K. Ashok; P. Kuppusami; C. Sanjeeviraja; M. Jayachandran 📂 Article 📅 2008 🏛 John Wiley and Sons 🌐 English ⚖ 180 KB

## Abstract Thin films of about 1μm Titanium Aluminum Nitride (TiAlN) were deposited onto mild steel substrates by reactive direct current (DC) magnetron sputtering using a target consisting of equal segments of titanium and aluminum. X‐ray diffraction (XRD) analysis showed that the TiAlN phase had