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Growth of SiO 2 and TiO 2 thin films deposited by reactive magnetron sputtering and PECVD by the incorporation of non-directional deposition fluxes

✍ Scribed by Alvarez, R.; Romero-Gomez, P.; Gil-Rostra, J.; Cotrino, J.; Yubero, F.; Gonzalez-Elipe, A. R.; Palmero, A.

Book ID
120382592
Publisher
John Wiley and Sons
Year
2013
Tongue
English
Weight
496 KB
Volume
210
Category
Article
ISSN
0031-8965

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