Deposition of Ag nanostructures on TiO2
β
J. Zuo
π
Article
π
2010
π
Elsevier Science
π
English
β 587 KB
Ag nanostructures on TiO 2 films were deposited by RF magnetron sputtering under variable deposition parameters, such as DC potential, RF-power and total pressure. The concentration, shape, and distribution of the deposited nanostructures and continuous Ag films on thin films of TiO 2 can be tailore