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Growth of diamond films by a 5-kW microwave plasma CVD reactor

✍ Scribed by Ando, Yutaka; Tachibana, Takeshi; Kobashi, Koji

Book ID
121695665
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
675 KB
Volume
10
Category
Article
ISSN
0925-9635

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Growth of nanocrystalline diamond films
Growth of nanocrystalline diamond films deposited by microwave plasma CVD system at low substrate temperatures
✍ Potocky, S. ;Kromka, A. ;Potmesil, J. ;Remes, Z. ;Polackova, Z. ;Vanecek, M. πŸ“‚ Article πŸ“… 2006 πŸ› John Wiley and Sons 🌐 English βš– 346 KB

## Abstract Nanocrystalline diamond (NCD) films were grown by microwave plasma CVD in hydrogen‐based gas mixture. Deposition experiments were performed at different temperatures varying from 370 to 1100 Β°C. Before growth step, silicon (100) oriented substrates were nucleated by bias enhanced nuclea