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Growth by Liquid-Injection MOCVD and Properties of HfO2 Films for Microelectronic Applications

✍ Scribed by C. Dubourdieu; E. Rauwel; C. Millon; P. Chaudouët; F. Ducroquet; N. Rochat; S. Rushworth; V. Cosnier


Publisher
John Wiley and Sons
Year
2006
Tongue
English
Weight
516 KB
Volume
12
Category
Article
ISSN
0948-1907

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