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Growth and characterization of epitaxial ultra-thin NbN films on 3C-SiC/Si substrate for terahertz applications

✍ Scribed by Dochev, D; Desmaris, V; Pavolotsky, A; Meledin, D; Lai, Z; Henry, A; Janzén, E; Pippel, E; Woltersdorf, J; Belitsky, V


Book ID
119942432
Publisher
Institute of Physics
Year
2011
Tongue
English
Weight
713 KB
Volume
24
Category
Article
ISSN
0953-2048

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The epitaxial growth of cubic-silicon carbide SiC on Si substrates was carried out by triode plasma CVD using Ž . dimethylsilane DMS as source gas. The lowering of electron temperature and the reduction of the rf fluctuation of plasma space potential in the afterglow plasma region were realized by a