✦ LIBER ✦

Graphitized filament plasma enhanced CVD deposition of nanocrystalline diamond

✍ Scribed by Lisi, Nicola; Giorgi, Rossella; Dikonimos, Theodoros; Salernitano, Elena; Gagliardi, Serena; Giorgi, Leonardo; Contini, Vittoria; Morales, Piero

Book ID: 121313100
Publisher: Elsevier Science
Year: 2010
Tongue: English
Weight: 952 KB
Volume: 19
Category: Article
ISSN: 0925-9635
DOI: 10.1016/j.diamond.2010.08.002

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Process Control of CVD Deposition of Nan

Process Control of CVD Deposition of Nanocrystalline Diamond Films by Plasma Diagnostics

✍ Woehrl, Nicolas; Buck, Volker 📂 Article 📅 2011 🏛 Oldenbourg Wissenschaftsverlag 🌐 German ⚖ 339 KB

Plasma Chemical Vapor Deposition of Nano

Plasma Chemical Vapor Deposition of Nanocrystalline Diamond

✍ Okada K. 📂 Library 📅 2004 🏛 American Scientific Publishers 🌐 English ⚖ 2 MB

Synthesis of nanocrystalline diamond fil

Synthesis of nanocrystalline diamond films using microwave plasma CVD

✍ Yoshikawa, Hiromichi; Morel, Cedric; Koga, Yoshinori 📂 Article 📅 2001 🏛 Elsevier Science 🌐 English ⚖ 547 KB

Morphological features of diamond-like c

Morphological features of diamond-like carbon films deposited by plasma-enhanced CVD

✍ Z Sun 📂 Article 📅 2000 🏛 Elsevier Science 🌐 English ⚖ 366 KB

High rate deposition of diamond-like car

High rate deposition of diamond-like carbon films by magnetically enhanced plasma CVD

✍ Z Sun; X Shi; E Liu 📂 Article 📅 1999 🏛 Elsevier Science 🌐 English ⚖ 212 KB

Growth of nanocrystalline diamond films

Growth of nanocrystalline diamond films deposited by microwave plasma CVD system at low substrate temperatures

✍ Potocky, S. ;Kromka, A. ;Potmesil, J. ;Remes, Z. ;Polackova, Z. ;Vanecek, M. 📂 Article 📅 2006 🏛 John Wiley and Sons 🌐 English ⚖ 346 KB

## Abstract Nanocrystalline diamond (NCD) films were grown by microwave plasma CVD in hydrogen‐based gas mixture. Deposition experiments were performed at different temperatures varying from 370 to 1100 °C. Before growth step, silicon (100) oriented substrates were nucleated by bias enhanced nuclea