Plasma Chemical Vapor Deposition of Nanocrystalline Diamond
β Scribed by Okada K.
- Book ID
- 127452235
- Publisher
- American Scientific Publishers
- Year
- 2004
- Tongue
- English
- Weight
- 2 MB
- Category
- Library
- ISBN-13
- 9781588830647
No coin nor oath required. For personal study only.
π SIMILAR VOLUMES
## Abstract {100} Facetβterminated nanocrystalline and {100} textured largeβgrained polycrystalline diamond (PCD) have been grown simultaneously not only on different substrates but also on the same substrate from a single deposition run using highβpower microwave plasma chemical vapor deposition (
## Abstract In this work, we study the influence of oxygen additive in the gas phase on hydrogen impurity incorporation into thick nanocrystalline diamond (NCD) films. Various diamond samples were grown on large silicon wafers of 5.08βcm diameter by adjusting the amount of oxygen and nitrogen addit