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Process Control of CVD Deposition of Nanocrystalline Diamond Films by Plasma Diagnostics

✍ Scribed by Woehrl, Nicolas; Buck, Volker

Book ID
120166871
Publisher
Oldenbourg Wissenschaftsverlag
Year
2011
Tongue
German
Weight
339 KB
Volume
225
Category
Article
ISSN
0942-9352

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## Abstract Nanocrystalline diamond (NCD) films were grown by microwave plasma CVD in hydrogen‐based gas mixture. Deposition experiments were performed at different temperatures varying from 370 to 1100 Β°C. Before growth step, silicon (100) oriented substrates were nucleated by bias enhanced nuclea