Germanium diffusion and nanocrystal formation in silicon oxide on silicon substrate under rapid thermal annealing

✍ Scribed by Choi, W. K.; Ho, V.; Ng, V.; Ho, Y. W.; Ng, S. P.; Chim, W. K.

• Book ID: 120939754
• Publisher: American Institute of Physics
• Year: 2005
• Tongue: English
• Weight: 430 KB
• Volume: 86
• Category: Article
• ISSN: 0003-6951
• DOI: 10.1063/1.1891290