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Modeling of boron diffusion in polysilicon-on-silicon structures using a rapid thermal anneal step for ultra-shallow junction formation

✍ Scribed by Akif Sultan; Shubneesh Batra; Gayle E. Lux; Sanjay Banerjee


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
683 KB
Volume
32
Category
Article
ISSN
0921-5107

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