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Ge diffusion in Ge metal oxide semiconductor with chemical vapor deposition HfO[sub 2] dielectric

✍ Scribed by Lu, N.; Bai, W.; Ramirez, A.; Mouli, C.; Ritenour, A.; Lee, M. L.; Antoniadis, D.; Kwong, D. L.

Book ID: 120444523
Publisher: American Institute of Physics
Year: 2005
Tongue: English
Weight: 662 KB
Volume: 87
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.2001757

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