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Gas mixture dependence of the LCVD of SiO2 films using an ArF laser

✍ Scribed by T. Szörényi; P. González; D. Fernández; J. Pou; B. León; M. Pérez-Amor


Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
284 KB
Volume
46
Category
Article
ISSN
0169-4332

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