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Fully scaled 0.5 μm MOS circuits by synchrotron radiation X-ray lithography: Devices fabrication and overlay evaluation

✍ Scribed by J.P. Silverman; V. Dimilia; D. Katcoff; L.K. Wang; J.M. Warlaumont; A.D. Wilson; R. Devenuto; B. Hill; L.C. Hsia; R. Rippstein

Book ID
107920371
Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
945 KB
Volume
9
Category
Article
ISSN
0167-9317

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