Fully scaled 0.5μm MOS circuits by synchrotron radiation X-ray lithography: Mask fabrication and chraterization

✍ Scribed by R. Viswanathan; R. Acosta; D. Seeger; H. Voelker; A.D. Wilson; I. Babich; J. Maldonado; J. Warlaumont; O. Vladirmirsky; F. Hohn; D. Crockatt; R. Fair

• Publisher: Elsevier Science
• Year: 1989
• Tongue: English
• Weight: 444 KB
• Volume: 9
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(89)90021-x