Amorphous boron and boron phosphide 5lms were prepared on silica glass by a solid source molecular beam deposition (SSMBD) method and a low-pressure chemical vapor deposition method (LPCVD) by adapting gas source molecular beam deposition at a reactant pressure of 1.33 Pa. The 5lms were characterize
Freestanding boron phosphide films
โ Scribed by R.J. Baughman; D.S. Ginley
- Publisher
- Elsevier Science
- Year
- 1983
- Tongue
- English
- Weight
- 387 KB
- Volume
- 50
- Category
- Article
- ISSN
- 0022-4596
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