Amorphous boron and boron phosphide 5lms were prepared on silica glass by a solid source molecular beam deposition (SSMBD) method and a low-pressure chemical vapor deposition method (LPCVD) by adapting gas source molecular beam deposition at a reactant pressure of 1.33 Pa. The 5lms were characterize
Vapor transport of boron, boron phosphide and boron arsenide
โ Scribed by Alton F. Armington
- Publisher
- Elsevier Science
- Year
- 1967
- Tongue
- English
- Weight
- 180 KB
- Volume
- 1
- Category
- Article
- ISSN
- 0022-0248
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