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Formation of TiSi2 by electron beam annealing of arsenic implanted titanium films on silicon substrates

✍ Scribed by EA Maydell-Ondrusz; RE Harper; IH Wilson; KG Stephens


Publisher
Elsevier Science
Year
1984
Tongue
English
Weight
889 KB
Volume
34
Category
Article
ISSN
0042-207X

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