Formation of TiSi2 and shallow junction by As+ ion-beam mixing and infrared rapid heat treatment

✍ Scribed by Ye, M.; Lin, H.W.; Tsien, P.-H.; Zhang, J.-P.; Yin, S.-D.

• Book ID: 114535068
• Publisher: IEEE
• Year: 1989
• Tongue: English
• Weight: 685 KB
• Volume: 36
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/16.19962