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Formation of rhodium silicide by rapid thermal annealing and by ion beam mixing

✍ Scribed by E.P. Burte; G. Neuner

Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 766 KB
Volume: 53
Category: Article
ISSN: 0169-4332
DOI: 10.1016/0169-4332(91)90278-r

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