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Formation of thin Cu2S (chalcocite) films using reactive sputtering techniques

Publisher
Elsevier Science
Year
1980
Tongue
English
Weight
162 KB
Volume
30
Category
Article
ISSN
0042-207X

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✦ Synopsis

Classified abstracts 4523-4531 substrate are minimal. Photoresist images are not degraded, and subsequent lift-off is facilitated., S M Kane and K Y Ahn, J Yuc Sci Tecl~ol, 16 (2). 1979, 171-174.

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The technologies of fabrication of thin film phosphors based on gallium nitride using rf-magnetron sputtering are developed and properties of films are studied. Spectral parameters of rf-discharge plasma emission of nitrogen used as a working gas are investigated. The dependence of GaN thin film dep