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Formation of ternary Ni-silicide on relaxed and strained SiGe layers

✍ Scribed by Q.T. Zhao; D. Buca; St. Lenk; R. Loo; M. Caymax; S. Mantl


Book ID
108207360
Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
327 KB
Volume
76
Category
Article
ISSN
0167-9317

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Effects of hydrogen treatment on strain
✍ Y. Yamashita; R. Nakagawa; Y. Sakamoto; T. Ishiyama; Y. Kamiura πŸ“‚ Article πŸ“… 2006 πŸ› Elsevier Science 🌐 English βš– 132 KB

Effects of hydrogen treatment on post-growth strain relaxation of GeSi epitaxial films on Ge substrate were studied. We found that pre-hydrogen treatment at room temperature enhanced strain relaxation during subsequent thermal treatment. We also confirmed that the relaxation enhancement effect becam