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Formation of silicon nanograss and microstructures on silicon using deep reactive ion etching

✍ Scribed by Mehran, M.; Sanaee, Z.; Mohajerzadeh, S.

Book ID
114461471
Publisher
The Institution of Engineering and Technology
Year
2010
Tongue
English
Weight
395 KB
Volume
5
Category
Article
ISSN
1750-0443

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Different processes involving an inductively coupled plasma reactor are presented either for deep reactive ion etching or for isotropic etching of silicon. On one hand, high aspect ratio microstructures with aspect ratio up to 107 were obtained on sub-micron trenches. Application to photonic MEMS is