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Formation of oxygen related donors in step-annealed CZ-silicon

✍ Scribed by Vikash Dubey; Shyam Singh

Book ID
110644104
Publisher
Springer-Verlag
Year
2002
Tongue
English
Weight
74 KB
Volume
25
Category
Article
ISSN
0250-4707

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## Abstract The characteristic features of production processes of thermal donors in Czochralski grown silicon heat treated at __T__=450Β°C under hydrostatic pressures of about 1 GPa are studied. Two families of oxygen‐related donors are formed under compressive stress. The first one is the well‐kno