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Formation of nanocrystalline CrSi2 layers in Si by ion implantation and pulsed annealing

✍ Scribed by R.I. Batalov; R.M. Bayazitov; V.F. Valeev; N.G. Galkin; D.L. Goroshko; K.N. Galkin; E.A. Chusovitin; P.I. Gaiduk; G.D. Ivlev; E.I. Gatskevich

Publisher: Elsevier
Year: 2011
Tongue: English
Weight: 489 KB
Volume: 11
Category: Article
ISSN: 1875-3892
DOI: 10.1016/j.phpro.2011.01.010

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