𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Formation of intrinsic oxide layers by ion implantation of silicon and titanium in the low kiloelectronvolt regime

✍ Scribed by H. Oechsner; J. Waldorf


Book ID
108025625
Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
481 KB
Volume
139
Category
Article
ISSN
0921-5093

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES