Formation of carbon nitride films on Si(100) substrates by electron cyclotron resonance plasma assisted vapor deposition

✍ Scribed by Bousetta, A.; Lu, M.; Bensaoula, A.; Schultz, A.

• Book ID: 118230474
• Publisher: American Institute of Physics
• Year: 1994
• Tongue: English
• Weight: 685 KB
• Volume: 65
• Category: Article
• ISSN: 0003-6951
• DOI: 10.1063/1.112272