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Wide band gap silicon carbon nitride films deposited by electron cyclotron resonance plasma chemical vapor deposition

✍ Scribed by K.H Chen; J.-J Wu; C.Y Wen; L.C Chen; C.W Fan; P.F Kuo; Y.F Chen; Y.S Huang

Book ID: 114086816
Publisher: Elsevier Science
Year: 1999
Tongue: English
Weight: 563 KB
Volume: 355-356
Category: Article
ISSN: 0040-6090
DOI: 10.1016/s0040-6090(99)00486-1

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