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Focused boron ion beam implantation into silicon

โœ Scribed by M. Tamura; S. Shukuri; M. Ichikawa; Y. Wada; T. Ishitani


Book ID
113277194
Publisher
Elsevier Science
Year
1985
Tongue
English
Weight
655 KB
Volume
7-8
Category
Article
ISSN
0168-583X

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โœ J. Teichert; L. Bischoff; S. Hausmann ๐Ÿ“‚ Article ๐Ÿ“… 1997 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 239 KB

We report the fabncation of metal-semiconductor-metal (MSM) photo detectors on silicon substrates with CoSi2 electrodes. The electrode patterns have been formed by ion beam synthesis applying maskless implantation with a cobalt focused ion beam. Implantation has been carried out with the substrate a