๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Focused phosphorus ion beam implantation into silicon

โœ Scribed by Y. Madokoro; S. Shukuri; K. Umemura; M. Tamura


Book ID
113280227
Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
510 KB
Volume
39
Category
Article
ISSN
0168-583X

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Fabrication of MSM detector structures o
โœ J. Teichert; L. Bischoff; S. Hausmann ๐Ÿ“‚ Article ๐Ÿ“… 1997 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 239 KB

We report the fabncation of metal-semiconductor-metal (MSM) photo detectors on silicon substrates with CoSi2 electrodes. The electrode patterns have been formed by ion beam synthesis applying maskless implantation with a cobalt focused ion beam. Implantation has been carried out with the substrate a

Phosphorus implantation into 4H-silicon
โœ M. A. Capano; R. Santhakumar; R. Venugopal; M. R. Melloch; J. A. Cooper ๐Ÿ“‚ Article ๐Ÿ“… 2000 ๐Ÿ› Springer US ๐ŸŒ English โš– 133 KB