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Carrier concentration profiles by high-energy boron ion implantation into silicon

✍ Scribed by H. Sayama; M. Takai; S. Namba; H. Ryssel


Book ID
113282005
Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
345 KB
Volume
59-60
Category
Article
ISSN
0168-583X

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