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Fluorine-enhanced thermal oxidation of silicon in the presence of NF3

โœ Scribed by Morita, M.; Kubo, T.; Ishihara, T.; Hirose, M.


Book ID
121339736
Publisher
American Institute of Physics
Year
1984
Tongue
English
Weight
493 KB
Volume
45
Category
Article
ISSN
0003-6951

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