✦ LIBER ✦

The Enhanced Diffusion of Arsenic and Phosphorus in Silicon by Thermal Oxidation

✍ Scribed by Ishikawa, Yutaka

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

About boron and arsenic diffusions in po

✍ B. Semmache; A. Merabet; C. Gontrand; A. Laugier 📂 Article 📅 1996 🏛 Elsevier Science 🌐 English ⚖ 307 KB

Thermal Diffusion of Ion-Implanted Arsen

✍ Tsukamoto, Katsuhiro; Akasaka, Yoichi; Kijima, Koichi 📂 Article 📅 1980 🏛 Institute of Pure and Applied Physics 🌐 English ⚖ 963 KB

High concentration diffusivity and clust

✍ Solmi, S.; Nobili, D. 📂 Article 📅 1998 🏛 American Institute of Physics 🌐 English ⚖ 365 KB

Comparison of arsenic and phosphorus dif

✍ S. Eguchi; J. L. Hoyt; C. W. Leitz; E. A. Fitzgerald 📂 Article 📅 2002 🏛 American Institute of Physics 🌐 English ⚖ 297 KB

Simulation of boron, phosphorus, and ars

✍ Uematsu, Masashi 📂 Article 📅 1997 🏛 American Institute of Physics 🌐 English ⚖ 641 KB

Simulation of retarded diffusion of anti

✍ T. Brabec; E. Guerrero; M. Budil; H. W. Poetzl 📂 Article 📅 1987 🏛 Springer 🌐 English ⚖ 416 KB